PURPOSE: To produce a halogenated polystyrenic resin useful as a resist having sensitivity to ionizing radiation, etc., by (co)polymerizing a styrenic monomer, etc. using a specific catalyst, halogenating the polymer in the polymerization system.
CONSTITUTION: A styrenic monomer or it and a monomer (e.g., maleic anhydride, etc.) copolymerizable with it are (co)polymerized in the presence of an organometallic compound (e.g., lithium naphthalene, etc.) shown by the formula RM or RM'X (R is alkyl, aryl, or aralkyl; X is R, or halogen; M is element of I group; M' is element of II group), and the polymer in the polymerization system is halogenated using a radical generator (e.g., diacyl peroxide, etc.) or light rays in the presence of a compound (e.g., chlorine, etc.) capable of producing a halogen radical, to give the desired halogenated polystyrenic resin.
KAMOSHITA YOUICHI
KOSHIBA MITSUNOBU
HARADA TOKOU
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