Title:
PRODUCTION OF HYDROXYSILANE AND/OR ITS OLIGOMER
Document Type and Number:
Japanese Patent JPH01111709
Kind Code:
A
Abstract:
PURPOSE:To produce a coating liq. for forming SiO2 film, without contamination of halogen ion and dopant, having good shelf life and no limitation of solvent to be used, by reacting alkoxysilane with water in the presence of solvent and solid catalyst. CONSTITUTION:The alkoxysilane and water are brought into contact with the solid catalyst when mixed and stirred or heated in the solvent. Thereby, the reaction proceeds exothermically to produce hydroxysilane and/or its oligomer. The reaction is easily stopped by separating reaction liq. from the solid catalyst to obtain a stable soln. without the catalyst. As the solid catalyst to be used in this case, for example, metal oxide such as Al2O3, ThO2, metal composite oxide such as TiO2-SiO2, clay mineral such as X-type zeolite and in addition Al2O3-SiO2 absorbed with sulfuric acid, phosphoric acid, etc., are exemplified.
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Inventors:
UCHIMURA SHUNICHIRO
SATO TONOBU
SATO TONOBU
Application Number:
JP26894987A
Publication Date:
April 28, 1989
Filing Date:
October 23, 1987
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C01B33/04; C07F7/08; C08G77/02; C09D183/00; B01J29/08; C23C18/12; H01L21/225; H01L21/316; (IPC1-7): B01J29/08; C01B33/04; C08G77/02; C09D3/82
Attorney, Agent or Firm:
Kunihiko Wakabayashi