Title:
PRODUCTION OF ITO SINTERED BODY AND SPUTTERING TARGET
Document Type and Number:
Japanese Patent JP3870446
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a high density ITO(indium oxide-tin oxide) sintered body and a sputtering target in which nodules having a possibility of causing defects in coating are not generated on the surface of the target in the sputtering of ITO thin coating used for the transparent electrode of a flat panel display or the like.
SOLUTION: A green compact obtd. by compacting indium oxide-tin oxide solid solution powder in which ≥90% has ≤1μm particle diameter or an indium oxide-tin oxide solid solution powder in which the maximum particle diameter is regulated to ≤1μm, the median size (the particle diameter of the powder equivalent to 50% of the cumulative distribution of the particle diameter) is regulated to ≤0.4μm, and the tap density is regulated to ≥1.8g/cm3, is sintered in an oxygen atmosphere to obtain an ITO sintered body.
Inventors:
Kentaro Utsumi
Akio Kondo
Akio Kondo
Application Number:
JP18594996A
Publication Date:
January 17, 2007
Filing Date:
July 16, 1996
Export Citation:
Assignee:
Tosoh Corporation
International Classes:
C04B35/64; C23C14/34; C23C14/08; (IPC1-7): C23C14/34; C04B35/64; C23C14/08
Domestic Patent References:
| JP6002124A | ||||
| JP5030905B2 |
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