Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PRODUCTION METHOD OF POLYCRYSTALLINE SILICON INGOT
Document Type and Number:
Japanese Patent JP2010235322
Kind Code:
A
Abstract:

To provide a method for producing a high purity polycrystalline silicon ingot from polycrystalline silicon which is produced by a zinc reduction method and subsequently taken out to the outside of a reaction apparatus.

The method for producing a polycrystalline silicon ingot includes: a melting step of melting polycrystalline silicon produced by a zinc reduction method, under the pressure of not more than 10-1 Pa at 1,410 to 1,600°C while supplying argon gas containing water vapor to the environment to obtain molten silicon; and a cooling step of successively cooling the molten silicon successively from a lower part to an upper part to crystallize to obtain a polycrystalline silicon ingot.


Inventors:
MIZOGUCHI TAKASHI
ITO KOJI
Application Number:
JP2009081798A
Publication Date:
October 21, 2010
Filing Date:
March 30, 2009
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
COSMO OIL CO LTD
International Classes:
C01B33/037
Domestic Patent References:
JP2002173311A2002-06-21
JPH06227808A1994-08-16
JPH10273311A1998-10-13
JP2006315879A2006-11-24
JP2005231956A2005-09-02
JP2002308616A2002-10-23
JP2004035382A2004-02-05
JP2004284935A2004-10-14
JP2002173311A2002-06-21
JPH06227808A1994-08-16
Foreign References:
WO1998016466A11998-04-23
Attorney, Agent or Firm:
Kenji Akatsuka
Yasuyuki Sakata
Ken Shibuya