Title:
PRODUCTION METHOD OF VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2022127384
Kind Code:
A
Abstract:
To provide a vapor deposition mask having reduced influence of thermal shrinkage in a vapor deposition process.SOLUTION: In a production method of a vapor deposition mask, a resist mask having a prescribed pattern formed thereon is formed on a support substrate through a base metal layer, and by depositing a metal by electroforming on a region where the resist mask is not formed on the base metal layer, a mask body having a thermal shrinkage of 8 ppm or more and 18 ppm or less is formed at the temperature of 25°C or higher and 35°C or lower, and after arranging a mask frame on the mask body, the mas body is separated from the support substrate.SELECTED DRAWING: Figure 1C
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Inventors:
YAMADA TETSUYUKI
Application Number:
JP2021025505A
Publication Date:
August 31, 2022
Filing Date:
February 19, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C25D1/10; C23C14/04; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners
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