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Title:
PRODUCTION OF MICROPATTERN STRUCTURE HAVING HIGH ASPECT RATIO
Document Type and Number:
Japanese Patent JPH05148369
Kind Code:
A
Abstract:

PURPOSE: To provide a polymer which shows high radiation sensitivity, can be depolymerized under the influence of X rays, can be therefore selectively dissolved and removed with a special developing agent, can be fabricated into micropattern structure materials by for example simple injection molding, press molding, extrusion molding and cast molding and does not undergo swelling, crazing and chipping.

CONSTITUTION: There is provided a process for the production of micropattern structures having a high aspect ratio by imagewise irradiation of a polymer with high-energy parallel radiation from an X-ray source, which process employs as the polymer an oxymethylene homopolymer or an oxymethylene copolymer.


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Inventors:
TOOMASU BUYUNSHIYU
PEETAA HESERU
GEERUHARUTO HOFUMAN
YURUGEN RANGEN
Application Number:
JP3631092A
Publication Date:
June 15, 1993
Filing Date:
February 24, 1992
Export Citation:
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Assignee:
BASF AG
International Classes:
B29C35/08; C08J3/28; G03F7/039; C08G2/08; G03F7/20; (IPC1-7): C08G2/08; C08J3/28; C08L59/00
Domestic Patent References:
JPS5817093B21983-04-05
JPH0216190B21990-04-16
Attorney, Agent or Firm:
Tajiro Taiji



 
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