Title:
PRODUCTION OF OPTICAL FILM FOR INFRARED
Document Type and Number:
Japanese Patent JPH09202961
Kind Code:
A
Abstract:
To provide a method for producing an optical film reduced in absorption due to moisture.
The surface of the substrate 8 consisting of a transmitting or reflecting member or the surface of an optical film 9 formed on the substrate is irradiated with argon ion at a beam voltage of 500 to 800eV to form one or more optical films 10 on the surface in the process 1, and an optical film 10 is formed on the surface of the substrate 8 or the surface of the optical film 9 formed on the substrate in the process 2. In this case, the optical film 10 is vapor-deposited while being irradiated with argon ion at a beam voltage of 300 to 600eV. The moisture content is further decreased by combining the processes 1 and 2.
Inventors:
KONISHI KAZUMASA
YAMAZAKI NOBORU
YAMAZAKI NOBORU
Application Number:
JP1192796A
Publication Date:
August 05, 1997
Filing Date:
January 26, 1996
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
G02B1/10; C23C14/06; C23C14/22; C23C14/24; G02B1/115; (IPC1-7): C23C14/06; C23C14/22; C23C14/24; G02B1/10
Attorney, Agent or Firm:
Akira Uchida (2 outside)