Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PRODUCTION OF PHENOLIC RESIN OLIGOMER
Document Type and Number:
Japanese Patent JPH08337547
Kind Code:
A
Abstract:

PURPOSE: To obtain a phenolic resin oligomer in a high yield while suppressing the production of byproducts having a high or a low molecular weight, useful as a curing agent, etc., for an epoxy resin by reacting in a specific solvent.

CONSTITUTION: This phenolic resin oligomer expressed by formula III is obtained by reacting phenols of formula I (x is 1, 2, 3; R1 is a 1-4C alkyl; y is 0, 1, 2, 3) with diformylphenols of formula II (R2 is H, a 1-10C alkyl, etc.; z is 0, 1, 2, 3) in the presence of an acid catalyst (e.g. formic acid) in a polar aprotic solvent (e.g. N,N-dimethylformamide). Further, the above polar aprotic solvent has ≥2.5D dipole moment and ≥15 dielectric constant.


Inventors:
MASUDA YOSHINORI
Application Number:
JP8592496A
Publication Date:
December 24, 1996
Filing Date:
March 13, 1996
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ARAKAWA CHEM IND
International Classes:
B01J31/02; C07B61/00; C07C37/20; C07C39/15; C07C39/367; C07C201/12; C07C205/21; C08G8/00; C08G8/10; (IPC1-7): C07C39/15; B01J31/02; C07C37/20; C07C39/367; C07C201/12; C07C205/21; C08G8/10