Title:
PRODUCTION OF POLYSILANE HAVING PHENOLIC GROUP
Document Type and Number:
Japanese Patent JP3343693
Kind Code:
B2
Abstract:
PURPOSE: To obtain a polysilane having excellent safety, environmental pollution resistance, solubility and film-forming property and useful for resist material, etc., in high efficiency and yield by the electrode reaction of a specific dihalosilane having phenol group using a specific metal as an anode.
CONSTITUTION: This polysilane expressed by formula II ((n) is 10-10,000) is produced by the electrode reaction of a dihalosilane of formula I (R1 is alkoxyalkyl, trialkylsilyl or benzyl; R2 is H, aryl, alkoxy or amino; X is halogen; (m) is 0-10) using a metal such as Mg as an anode.
Inventors:
Tatsuya Shono
Shigefumi Kashiwamura
Ryoichi Nishida
Hiroaki Murase
Shigefumi Kashiwamura
Ryoichi Nishida
Hiroaki Murase
Application Number:
JP4695093A
Publication Date:
November 11, 2002
Filing Date:
March 08, 1993
Export Citation:
Assignee:
Tatsuya Shono
OSAKA GAS CO.,LTD.
OSAKA GAS CO.,LTD.
International Classes:
C08G77/60; C08G77/48; (IPC1-7): C08G77/60
Domestic Patent References:
| JP4331235A |
Attorney, Agent or Firm:
Eiji Saegusa (4 others)
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