Title:
PRODUCTION OF SI-O CONTAINING COATING
Document Type and Number:
Japanese Patent JP3701700
Kind Code:
B2
Abstract:
PURPOSE: To obtain an Si-O contg. coating having improved properties such as a low stable dielectric constant by treating an Si-O contg. ceramic coating derived from hydrogen silsesquioxane resin with gaseous hydrogen.
CONSTITUTION: The top of an electronic substrate is coated with hydrogen silsesquioxane resin and the coated substrate is heated to a sufficient temp. for conversion to an Si-O contg. ceramic coating. The substrate is then exposed to an annealing atmosphere contg. gaseous hydrogen under sufficient conditions of time and temp. to anneal the formed Si-O contg. ceramic coating. The objective Si-O contg. coating is thus formed on the electronic substrate. A Pt, Rh or Cu catalyst may be used in the hydrogen silsesquioxane resin coating material so as to increase the rate and degree of conversion to silica. The heating temp. is usually 50-1,000°C and is preferably 200-600°C.
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Inventors:
David Stephen Balance
Robert Charles Camilletti
Diana Kai Dan
Robert Charles Camilletti
Diana Kai Dan
Application Number:
JP22328994A
Publication Date:
October 05, 2005
Filing Date:
September 19, 1994
Export Citation:
Assignee:
DOW CORNING CORPORATION
International Classes:
C01B33/00; C04B35/04; C01B33/113; H01L21/3105; H01L21/316; (IPC1-7): C01B33/00; H01L21/316
Domestic Patent References:
| JP5106054A | ||||
| JP4275337A |
Attorney, Agent or Firm:
Takashi Ishida
Taijiro Ogawa
Toshio Toda
Masaya Nishiyama
Taijiro Ogawa
Toshio Toda
Masaya Nishiyama