PRODUCTION OF ULTRAVIOLET RAY SENSITIVE CHEMICAL AMPLIFICATION TYPE RESIST AND METHOD FOR INSPECTING ULTRAVIOLET RAY SENSITIVE CHEMICAL

Japanese Patent JP3852157

B2

PROBLEM TO BE SOLVED: To make it possible to maintain the high quality of a chemical amplification type resist and to exactly draw precision patterns by selecting only the homogeneous resist in accordance with the compsn. ratios determined from the results of the discrimination of mol.wts. and the results of the measurement of UV absorptivity and transmittance.
SOLUTION: A solvent 2 which is the medium of the resist 1 is passed through a pump 3 at a specified flow rate and is mingled with the resist 1 in such a manner that a suitable viscosity is attained. The mixture is supplied to a precolumn 4. The respective mol.wts. of the compsn. mixed through a GPC column 5 are specified and the respective components are separated by each of the mol.wts. The resist subjected to the discrimination of the mol.wts. flows into a UV spectroscope 6, by which the UV absorption by each of the mol.wts. is measured. The UV absorption data measured by this UV spectroscope 6 is converted to three-dimensional data by a data processor 7. A measuring person specifies the compsn. ratios in accordance with the results of the UV spectrochemical analysis collected by the data processor 7 and the results of the mol.wt. analysis obtd. from the GPC column 5.

Hirose Minoru

JP12414497A

November 29, 2006

May 14, 1997

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富士通株式会社

G03F7/004; G03F7/039; G03F7/038; G03F7/26; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; G03F7/26; H01L21/027

JP5257282A
JP4245248A

Junichi Yokoyama

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