Title:
PROJECTION ALIGNER AND PROJECTION EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP3720582
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To correct magnification component in a shot occurred in a reticle, by estimating lens magnification in the shot using a specific equation, and accordingly using a magnification correction function of a projection lens to correct the magnification in the shot.
SOLUTION: When a specified magnification variation Δβ(i)s in a shot is larger than a magnification variation permissible value Δβsc in the shot at first mark measurement using an equation Δβs=C.Ap.S1.ΔβM (where C, p and q are coefficients), a sequence proceeds to a magnification correcting operation. A reticle alignment is applied to the stretched reticle, an error is assigned to each mark so that sum of squares of the error in the stretch becomes minimum, and registration in x, y and θ direction is performed in a reticle stage (S18). Subsequently, in accordance with a magnification correcting value of a projection lens according to the magnification component Δβ(i)s in the shot occurred, a magnification correction unit of the projection lens operates and magnification on the reticle is corrected (S19). If the magnification correction is ideally performed, magnification variation is not occurred on a wafer.
Inventors:
Masami Yonekawa
Application Number:
JP17054698A
Publication Date:
November 30, 2005
Filing Date:
June 04, 1998
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; G03F7/20; G03F9/00; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP10135119A | ||||
| JP10064811A | ||||
| JP8321459A | ||||
| JP6349703A |
Attorney, Agent or Firm:
Tetsuya Ito