Title:
PROJECTION ALIGNER AND MANUFACTURE OF DEVICE
Document Type and Number:
Japanese Patent JP3368091
Kind Code:
B2
Abstract:
PURPOSE: To prevent or lessen the drop of the resolution of a projection aligner by correcting the asymmetry on rotation of the optical property of a projecting optical system which occurs by projecting and exposing the pattern of the first object on the second object.
CONSTITUTION: Light emitted from the light source 2 for exposure illuminates a reticle 8, and reaches the wafer W on a stage 10 through a projecting lens 9, and sensitizes the resist applied on the surface W of a wafer. At this time, some of the luminous fluxes are reflected on the surface W of the wafer and transmit the projecting lens 9 in reverse direction. Some of these luminous fluxes transmit a half mirror 5 and become noise light. Temperature adjusters 13 and 14 correct the fault that the temperature distribution becomes asymmetrical on rotation about optical axis by the lens element within the projecting lens 9 absorbing exposed light. For example, the temperature distribution of the lens at large is made to be symmetrical on rotation about the optical axis by giving heat from outside to the section low in temperature in the vicinity of the lens element.
Inventors:
Yasuyuki Unno
Application Number:
JP9030295A
Publication Date:
January 20, 2003
Filing Date:
March 23, 1995
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
JP6177003A | ||||
JP7147224A | ||||
JP6441215A | ||||
JP5190409A | ||||
JP4192317A | ||||
JP58159329A | ||||
JP5347239A | ||||
JP59155842A | ||||
JP2185016A |
Attorney, Agent or Firm:
Yukio Takanashi