PROJECTION EXPOSING DEVICE

Title:

PROJECTION EXPOSING DEVICE

Document Type and Number:

Japanese Patent JPS59218729

Kind Code:

A

Abstract:

PURPOSE:To contrive the raising of projection working efficiency and the improvement of resolution on a projected pattern by a method wherein two rotating parabolic glass reflectors are provided in such a way as to oppose mutually to a central axis, a U-shaped mercury-arc lamp is provided at the focus of one side thereof, a slit is provided at the focus of other side thereof, and moreover, a diaphragm is arranged between both. CONSTITUTION:The rays of ultraviolet light emitted from a mercury-arc lamp 10 are reflected by a rotating parabolic glass reflector 11, but at this time, the rays of reflected light are turned into rays of light, which mutually reflect in parallel in the extent of the plane including the central axis L and head for the central axis L on the plane which makes a right angle with the optical axis of the glass reflector 11, because the mercury-arc lamp 10 has been arranged at the fucusing position of the parabolic glass reflector 11. These rays of reflected light are again reflected by a rotating parabolic glass reflector 12 on the other side and are directed downwards, but the rays of reflected light are focused in such a circular arc shape with a radius R to the central axis L as to parallel a slit 13 arranged at the focus of the glass reflector 12. Accordingly, a photo mask 1 is illuminated by the rays of light passed through this slit 13 through still one more illuminating optical system, second illuminating optical system 15, and the pattern of the photo mask 1 is projected in a circular arc shape on the surface of a wafer 1 by an image formation optical system 5. After this, by transferring a scanning stand 3 and scanning the whole surface of the photo mask 1, this projection exposing work is completed.

More Like This:

JP2629659	FORMATION OF CIRCUIT PATTERN
JP2017129875	EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE PRODUCTION METHOD
JPH11219878	ELECTRON BEAM EXPOSURE METHOD, EXPOSURE SYSTEM, AND PATTERN FORMING METHOD

Inventors:

MORITA MITSUHIRO

Application Number:

JP9227183A

Publication Date:

December 10, 1984

Filing Date:

May 27, 1983

Export Citation:

Click for automatic bibliography generation Help

Assignee:

HITACHI LTD

International Classes:

G03F7/20; H01L21/027; H01L21/30; (IPC1-7): H01L21/30; G03F7/20

Attorney, Agent or Firm:

Akio Takahashi

Previous Patent: IMPURITY INTRODUCTION INTO SEMICONDUCTOR SUBSTRATE

Next Patent: WAFER TREATMENT AND TREATING DEVICE THEREOF