To provide a projection exposure system which can form a correct conductor pattern while producing less dust without using a mechanism, such as a punch, but by forming a first and a second projected reticle reference marks through light exposure, and form a conductor pattern one by one in a simple configuration through simple processing.

It forms a projected pattern matching the image of a transfer pattern, a first and a second projected reticle reference marks corresponding to the first and the second reticle image marks showing the reference positions of the transfer pattern on a substrate by exposing with light. Detecting the positions of the first and second projected reticle reference marks, it adjusts the position of the object to expose.