Title:
PROJECTION OPTICAL SYSTEM, MANUFACTURING METHOD FOR PROJECTION OPTICAL SYSTEM, AND MANUFACTURING METHOD FOR EXPOSURE DEVICE AND MICRODEVICE
Document Type and Number:
Japanese Patent JP2002278077
Kind Code:
A
Abstract:
To provide a projection optical system which does not generates exposure unevenness due to periodical waving of the reflecting surface of a deflection member.
A scanning exposure type projection optical system, which forms a pattern image of a mask M on a plate by moving the mask M and a plate P relatively to the projection optical system, has at least one deflection member, and the continuation direction of the periodic waving of the reflecting surface of the deflection member is made to cross the direction orthogonal to the scanning direction of the mask and plate.
Inventors:
ENDO KAZUMASA
HATADA HITOSHI
HATADA HITOSHI
Application Number:
JP2001074832A
Publication Date:
September 27, 2002
Filing Date:
March 15, 2001
Export Citation:
Assignee:
NIKON CORP
International Classes:
G02B26/10; G02B17/08; G03F7/20; H01L21/027; (IPC1-7): G03F7/20; G02B17/08; G02B26/10; H01L21/027
Attorney, Agent or Firm:
Yoshihiro Fujimoto
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