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Title:
PROXIMITY-SCANNING EXPOSURE APPARATUS AND METHOD OF CONTROLLING THE SAME
Document Type and Number:
Japanese Patent JP2011134937
Kind Code:
A
Abstract:

To provide a proximity-scanning exposure apparatus, along with a method of controlling the same, capable of performing a composite molding for highly accurate exposure, even in a proximity-scanning exposure method.

The proximity-scanning exposure apparatus includes a substrate-transferring mechanism to transfer a substrate W in a predetermined direction, a plurality of mask holders 11a, 11c disposed in a staggering manner along the direction crossing the predetermined direction for holding a plurality of masks M with patterns Mp1 to Mp4 formed thereon, a plurality of mask actuators, and a plurality of irradiators disposed on the upper part of a plurality of mask holders. Exposure light is irradiated through the mask M to the substrate W transferred in the predetermined direction to expose the patterns of the mask M on the substrate. A plurality of patterns are arranged in the mask M, and a mask actuator is operated during an exposure process. A composite-molding operation can be performed for the highly accurate exposure, even in the proximity-scanning exposure method in which the substrate is continuously transferred at a constant speed by supplying a mask pattern changeover function for changing over the patterns Mp1 to Mp4.


Inventors:
KONDO TOSHIYUKI
KAWASHIMA HIRONORI
Application Number:
JP2009294030A
Publication Date:
July 07, 2011
Filing Date:
December 25, 2009
Export Citation:
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Assignee:
NSK LTD
International Classes:
H01L21/027; G03F7/20; H01L21/677
Domestic Patent References:
JP2009295950A2009-12-17
JP2008311517A2008-12-25
JP2007193296A2007-08-02
JP2008310164A2008-12-25
JP2008304853A2008-12-18
JP2009003365A2009-01-08
Foreign References:
WO2008120785A12008-10-09