To provide a proximity-scanning exposure apparatus, along with a method of controlling the same, capable of performing a composite molding for highly accurate exposure, even in a proximity-scanning exposure method.
The proximity-scanning exposure apparatus includes a substrate-transferring mechanism to transfer a substrate W in a predetermined direction, a plurality of mask holders 11a, 11c disposed in a staggering manner along the direction crossing the predetermined direction for holding a plurality of masks M with patterns Mp1 to Mp4 formed thereon, a plurality of mask actuators, and a plurality of irradiators disposed on the upper part of a plurality of mask holders. Exposure light is irradiated through the mask M to the substrate W transferred in the predetermined direction to expose the patterns of the mask M on the substrate. A plurality of patterns are arranged in the mask M, and a mask actuator is operated during an exposure process. A composite-molding operation can be performed for the highly accurate exposure, even in the proximity-scanning exposure method in which the substrate is continuously transferred at a constant speed by supplying a mask pattern changeover function for changing over the patterns Mp1 to Mp4.
KAWASHIMA HIRONORI
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JP2009003365A | 2009-01-08 |
WO2008120785A1 | 2008-10-09 |
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