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Title:
PURIFIED WATER MANUFACTURING APPARATUS AND METHOD FOR DRUG MANUFACTURING
Document Type and Number:
Japanese Patent JP2013184105
Kind Code:
A
Abstract:

To provide a purified water manufacturing apparatus and method for drug manufacturing that also allow use of a low chlorine resistant reverse osmosis membrane by removing residual chlorine from raw water, and also, can reduce the number of times of hot-water sterilization in the whole system by sufficiently suppressing the growth of common bacteria even if removing the residual chlorine from the raw water in the purified water manufacturing apparatus and method for drug manufacturing.

Raw water containing residual chlorine is supplied to an ultraviolet sterilizer 4 from a raw water tank 1 and irradiated with ultraviolet rays at an irradiance level of 30-500 Wh/m3 per 0.1 mg/L of residual chlorine concentration in the raw water in order to perform sterilization and to decompose the residual chlorine. The raw water is supplied to a reverse osmosis membrane device 6, and subsequently, the water permeating through the device is made to pass through electric deionization 7 and subjected to desalination treatment, and then the desalinated water is extracted as purified water.


Inventors:
IKEDA HIROYUKI
OSAWA KIMINOBU
UEDA YUSUKE
Application Number:
JP2012050548A
Publication Date:
September 19, 2013
Filing Date:
March 07, 2012
Export Citation:
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Assignee:
KURITA WATER IND LTD
International Classes:
C02F1/32; B01D61/44; B01D61/58; C02F1/42; C02F1/44; C02F1/469; C02F9/00
Domestic Patent References:
JPH0671256A1994-03-15
JPH09271772A1997-10-21
JP2007237062A2007-09-20
JP2002512883A2002-05-08
JP2011131138A2011-07-07
JP2006289283A2006-10-26
JP2011177708A2011-09-15
JP2011245413A2011-12-08
Other References:
JPN6015042205; Yangang Feng et al.: Journal of Environmental Engineering and Science Vol.6, 2007, p277-284
Attorney, Agent or Firm:
Tsuyoshi Shigeno