To provide a manufacturing method of an electronic device and a quality control system of an electronic device, which performs defect analysis in a high accuracy for each process step, based on net defects of random defects without being affected by cluster-type defects, enabling improvement in yields and shortening work periods.
The quality control method includes: a step for generating detected defect map data of each of a plurality of process steps; a step for determining if a cluster-type defect is present per element unit; a generating step for generating map data of electric function inspections; and a defect analysis step for generating net defect map data excluding carried-in defects for each of the plurality of process steps, based on the detected defect map data generated in the above step for each of the plurality of process steps, and performing defect analysis throughout the plurality of process steps, based on the generated net defect map data for each of the plurality of process steps and the map data of electric function inspections generated in the above step, in a state where element units that are determined to have cluster-type defects are eliminated. Thus the quality control of an electronic device is carried out based on the result of the defect analysis performed in the defect analysis step.
IWATA HISAFUMI
IKEDA YOKO
| JPH11264797A | 1999-09-28 |
| WO1997035337A1 | 1997-09-25 |