Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
RADIALLY POLARIZED LIGHT IN LITHOGRAPHIC APPARATUS
Document Type and Number:
Japanese Patent JP2006135330
Kind Code:
A
Abstract:

To provide a lithographic apparatus in which a radiation beam which illuminates a patterning means polarizes to the substantially radial direction, and a diaphragm intercepts the diffraction polarized to the radial direction of patterned radiation.

The lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC) are disclosed. In particular, the lithographic apparatus is designed to be used with radiation having a wavelength in the Deep Ultra-Violet (DUV), and radially polarized light is used to enhance the image contrast. In particular, partial clipping of the first order diffraction radiation is disclosed.


More Like This:
JPS53117385EXPOSURE MASK FOR PATTERNING
WO/2008/114411MATERIAL FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD
Inventors:
DE WINTER LAURENTIUS CORNELIUS
HUBERT KLAASSEN MICHEL FRANSOI
Application Number:
JP2005320265A
Publication Date:
May 25, 2006
Filing Date:
November 04, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ASML NETHERLANDS BV
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yutaka Yoshida



 
Previous Patent: LATERAL SURFACE LIGHT-EMISSION LED DEVICE AND MANUFACTURING METHOD THEREOF

Next Patent: LITHOGRAPHY SYSTEM AND DEVICE MANUFACTURING METHOD