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Title:
RADIATION SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002099089
Kind Code:
A
Abstract:

To provide a radiation sensitive composition effectively responding to electronic beams and excellent in roughness, etching resistance, and sensitivity and capable of forming a minute pattern highly accurately and stably.

This radiation sensitive composition contains the following (A) and (B): (A) a compound represented by formula (1). (Wherein, R1, R2 and R3 each independently represent hydrogen atom or a t-butoxycarbonyl group. At least one of R1, R2 and R3 is hydrogen atom and at least one of R1, R2 and R3 is a t-butoxycarbonyl group). (B) a compound generating an acid by irradiation with radioactive rays.


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Inventors:
SHIROTA YASUHIKO
KAGEYAMA HIROSHI
KADOTA TOSHIAKI
KAI TOSHIYUKI
Application Number:
JP2000292673A
Publication Date:
April 05, 2002
Filing Date:
September 26, 2000
Export Citation:
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Assignee:
SHIROTA YASUHIKO
JSR CORP
International Classes:
C07C69/96; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C07C69/96; G03F7/004; H01L21/027
Domestic Patent References:
JPH0973168A1997-03-18
JP2002099088A2002-04-05
JPH08262719A1996-10-11
Attorney, Agent or Firm:
Masataka Oshima



 
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