Title:
RADIATION SENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002107932
Kind Code:
A
Abstract:
To obtain a high sensitivity radiation sensitive composition having such a resolution as to enable very fine patterning.
The radiation sensitive composition contains a siloxane polymer having a fluorine-containing substituent and an acid generating agent which generates an acid when irradiated with radiation or the radiation sensitive composition contains a siloxane polymer having a fluorine-containing substituent and a base generating agent which generates a base when irradiated with a radiation.
Inventors:
TAMURA KAZUTAKA
Application Number:
JP2000303204A
Publication Date:
April 10, 2002
Filing Date:
October 03, 2000
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/038; C08K5/00; C08L83/08; G03F7/004; G03F7/075; H01L21/027; (IPC1-7): G03F7/038; C08K5/00; C08L83/08; G03F7/004; G03F7/075; H01L21/027
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