Title:
希ガス回収システムおよび希ガス回収方法
Document Type and Number:
Japanese Patent JP7198676
Kind Code:
B2
Abstract:
To provide a rare gas recovery system capable of recovering and recycling the rare gas supplied to a process chamber.SOLUTION: A rare gas recovery system includes: a vacuum pump unit 3 that exhausts a process chamber 1 to which a rare gas and a process gas are supplied to process a substrate, and to which an inert gas is supplied as a purge gas; an exhaust gas processing device 5 that removes a component other than the rare gas and the inert gas from the exhaust gas discharged from the vacuum pump unit 3; a gas separation unit 7 that separates the rare gas and the inert gas discharged from the exhaust gas processing device 5 from each other; and a rare gas return line 30 that returns the rare gas separated by the gas separation unit 7 to the process chamber 1.SELECTED DRAWING: Figure 1
Inventors:
Hiroshi Ikeda
Tetsuo Komai
Youichi Mori
Kazuo Morisaki
Tetsuo Komai
Youichi Mori
Kazuo Morisaki
Application Number:
JP2019007698A
Publication Date:
January 04, 2023
Filing Date:
January 21, 2019
Export Citation:
Assignee:
Ebara Corporation
International Classes:
H01L21/3065; C23C16/44; H01L21/205; H01L21/31
Domestic Patent References:
| JP2013128120A | ||||
| JP2007507635A | ||||
| JP2003164720A |
Attorney, Agent or Firm:
Tetsuya Hirosawa
Yutaro Watanabe
Yutaro Watanabe
Previous Patent: Solid-state imaging device, its driving circuit, and imaging device
Next Patent: Oil-in-water emulsion composition
Next Patent: Oil-in-water emulsion composition