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Patent Searching and Data


Title:
RESIN COMPOSITION AND APPLICATION OF THE SAME
Document Type and Number:
Japanese Patent JP2004238621
Kind Code:
A
Abstract:

To obtain a resin composition effectively preventing deterioration of coated films and reduction of staining resistance of the coated films.

The resin composition comprises a polymer obtained by polymerizing following monomers (a)-(c) and a solvent, wherein (a) is an acrylate monomer, (b) is a tertiary carboxylic acid ester, and (c) is a monomer selected from the group consisting of a fluoroacrylate monomer, a silicone monomer and their mixtures.


Inventors:
MAO-JUN YEE
CHUN-SHUN CHAN
Application Number:
JP2004020799A
Publication Date:
August 26, 2004
Filing Date:
January 29, 2004
Export Citation:
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Assignee:
ETERNAL CHEMICAL CO LTD
International Classes:
B05D7/24; C08F20/06; C08F220/10; C08K5/03; C08K5/07; C08K5/10; C08L1/00; C08L33/06; C09D7/12; C09D125/08; C09D129/10; C09D131/00; C09D133/00; C09D163/00; C09D183/04; C09D183/06; C09D183/08; (IPC1-7): C08L33/06; B05D7/24; C08F220/10; C08K5/03; C08K5/07; C08K5/10; C09D7/12; C09D125/08; C09D129/10; C09D131/00; C09D133/00; C09D163/00; C09D183/04; C09D183/06; C09D183/08
Domestic Patent References:
JP2001162924A2001-06-19
JPH1053623A1998-02-24
JPH1160646A1999-03-02
Attorney, Agent or Firm:
Alga Patent Office, a patent business corporation
Miyuki Ariga
Toshio Takano
Toshio Nakajima
Asano Yasutaka
Hiromi Matoba
Masaki Murata
Hiroto Yamamoto