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Title:
RESIN, RESIST COMPOSITION AND PRODUCTION METHOD FOR RESIST PATTERN
Document Type and Number:
Japanese Patent JP2011162779
Kind Code:
A
Abstract:

To provide a resist composition capable of forming excellent line edge roughness.

There is provided a resin having a structural unit derived from a compound represented by formula (I). In formula (I), R1 represents H, a halogen atom or (halogen-containing) 1-6C alkyl; R2 represents H, or (halogen-containing) 1-6C alkyl; and X1 represents a single bond or 1-6C alkylene, wherein -CH2- contained in the alkylene may be substituted with -O- or -CO-.


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Inventors:
FUJI YUSUKE
ICHIKAWA KOJI
SUGIHARA MASAKO
Application Number:
JP2011005540A
Publication Date:
August 25, 2011
Filing Date:
January 14, 2011
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F20/28; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation



 
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