RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2014002355

Kind Code:

A

Abstract:

To provide a resist composition from which a negative resist pattern with good DOF (depth of focus) can be produced.

The resist composition comprises: a resin (A1) having at least one structural unit selected from the group consisting of a methacrylate structural unit having 2-alkyladamantane in a side chain and a methacrylate structural unit having a specified 2-alkyl substituted monocyclic structure in a side chain, and a structural unit including a fluorine atom; a resin (A2) having no fluorine atom in the molecule; an acid generator (B); and a compound (I) represented by formula (I). In the formula, R^D1 and R^D2 each represents a hydrocarbon group having 1 to 12 carbon atoms, or the like; and m' and n' each represents an integer of 0 to 4.

Inventors:

ICHIKAWA KOJI
YOSHIDA MASASHI
YAMAGUCHI NORIFUMI

Application Number:

JP2013024160A

Publication Date:

January 09, 2014

Filing Date:

February 12, 2013

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/038; C08F220/22; G03F7/004; G03F7/039; G03F7/32; H01L21/027

Domestic Patent References:

JP2012021143A	2012-02-02
JP2012027438A	2012-02-09
JP2010197413A	2010-09-09
JP2011123480A	2011-06-23
JP2012021143A	2012-02-02
JP2012027438A	2012-02-09

Foreign References:

US20120028188A1

2012-02-02

Attorney, Agent or Firm:

Toru Nakayama
Toru Sakamoto

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