Title:
レジスト組成物、レジストパターン形成方法及び酸拡散制御剤
Document Type and Number:
Japanese Patent JP7407586
Kind Code:
B2
Abstract:
A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rd01 represents a monovalent organic group, Rd02 represents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation
Inventors:
Hiroto Yamazaki
Todoroki Hoshiji
潮▲崎▼ 雅宏
Nobuhiro Dobayashi
Todoroki Hoshiji
潮▲崎▼ 雅宏
Nobuhiro Dobayashi
Application Number:
JP2019229770A
Publication Date:
January 04, 2024
Filing Date:
December 19, 2019
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2015081960A | ||||
| JP2020098330A |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida