To provide a resist composition which ensures excellent resolution and shape of a pattern obtained therefrom.
The resist composition comprises an aromatic compound and an acid generator, wherein the aromatic compound has an acid-labile group and a molecular weight of 300-2,000, and the acid generator is a resin having a structural unit represented by formula (I), wherein R1 represents a hydrogen atom, a halogen atom or a 1-6C alkyl group which may have a halogen atom; L represents a single bond or a divalent 1-17C saturated hydrocarbon group which may have a substituent; W represents a divalent 3-36C alicyclic hydrocarbon group which may have a substituent or a divalent 6-36C aromatic hydrocarbon group which may have a substituent; X1 represents a divalent 1-17C saturated hydrocarbon group which may have a substituent; Rd represents a hydrogen atom or a 1-6C alkyl group; Qa and Qb each independently represent a fluorine atom or a 1-6C perfluoroalkyl; Za+ represents an organic cation; and * represents a bond.
ANDO NOBUO
YAMASHITA HIROKO
Tadashi Sugakawa
Hiroaki Ito
Hisahiko Ueki
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