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Title:
RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2012252124
Kind Code:
A
Abstract:

To provide a resist composition which enables production of a pattern with an excellent pattern collapse margin (PCM).

A resist composition contains a compound (I) expressed by the formula (I), salt (B1) expressed by the formula (B1), a resin which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and a solvent.


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Inventors:
MASUYAMA TATSURO
MUKAI YUICHI
Application Number:
JP2011124086A
Publication Date:
December 20, 2012
Filing Date:
June 02, 2011
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; G03F7/039; H01L21/027; C07C219/12
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto



 
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