レジスト材料及びパターン形成方法

Title:

レジスト材料及びパターン形成方法

Document Type and Number:

Japanese Patent JP6459989

Kind Code:

B2

Abstract:

A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.

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Inventors:

Jun Hatakeyama
Masaki Ohashi

Application Number:

JP2016008473A

Publication Date:

January 30, 2019

Filing Date:

January 20, 2016

Export Citation:

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Assignee:

Shin-Etsu Chemical Co., Ltd.

International Classes:

G03F7/004; C07C229/54; C07C229/56; C07C381/12; C07D295/155; C08F212/14; C08F220/12; C08F220/38; G03F7/038; G03F7/039; G03F7/20

Domestic Patent References:

JP2013250431A
JP2013029823A
JP2004198724A
JP2017067966A
JP2016157105A
JP2016200805A
JP2017058447A

Foreign References:

WO2010134477A1
US20130052585

Attorney, Agent or Firm:

Hideaki International Patent Office

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