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Patent Searching and Data


Title:
RESIST
Document Type and Number:
Japanese Patent JPH01277234
Kind Code:
A
Abstract:

PURPOSE: To ensure faithful transfer of a pattern to a substrate, etc., by using novolak resin obtd. by condensing isopropenylphenol and other phenol deriv. with a carbonyl compd. as an alkali-soluble resin.

CONSTITUTION: Novolak resin contg. structure units of isopropenylphenol which clears the profile of a pattern, increases the mol.wt. and improves the heat resistance is used as an alkali-soluble resin for a resist. The novolak resin further contains structural units of xylenol having high heat resistance and/or structural units of cresol which clears the profile of a pattern. Novolak resin obtd. by condensing m-isopropenylphenol, m-cresol and 3,5-xylenol with a carbonyl compd. can remarkably improve the characteristics of a resist because it has superior heat resistance and resolving power and can extremely clear the profile of a pattern.


Inventors:
HAYASE SHUJI
GOKOCHI TORU
ONISHI KIYONOBU
HORIGUCHI RUMIKO
Application Number:
JP10621688A
Publication Date:
November 07, 1989
Filing Date:
April 28, 1988
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
G03C1/72; G03F7/039; H01L21/027; (IPC1-7): G03C1/72; H01L21/30
Attorney, Agent or Firm:
Takehiko Suzue (2 outside)