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Patent Searching and Data


Title:
RESONANT TUNNEL DIODE AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2012190859
Kind Code:
A
Abstract:

To provide a resonant tunnel diode whose peak valley current ratio is high and which is capable of being manufactured without employing special devices and a manufacturing method thereof.

A first quantum well layer 11 and a second quantum well layer 12 are arranged in pairs. Both of the first quantum well layer 11 and the second quantum well layer 12 are composed of π conjugate molecules. The π conjugate molecules have an energy level of a molecular orbital which exists in isolation discretizing towards energy vertical directions and have a steep state density locally towards energy vertical directions. The first quantum well layer 11 is formed by being sandwiched between a first energy barrier layer 13 and a second energy barrier layer 14 and the second quantum well layer 12 is formed by being sandwiched between the second energy barrier layer 14 and a third energy barrier layer 15. A first electrode 16 is formed on the opposite side of the first quantum well layer 11 of the energy barrier layer 13 and a second electrode 17 is formed on the opposite side of the second quantum well layer 12 of the third energy barrier layer 15.


Inventors:
MAJIMA YUTAKA
AZUMA YASUO
OGAWA DAISUKE
Application Number:
JP2011050895A
Publication Date:
October 04, 2012
Filing Date:
March 08, 2011
Export Citation:
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Assignee:
JAPAN SCIENCE & TECH AGENCY
International Classes:
H01L21/329; H01L29/88
Attorney, Agent or Firm:
平山 一幸
篠田 哲也