Title:
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023078096
Kind Code:
A
Abstract:
To provide a salt, a resin and the like, and a resist composition which allow a resist pattern having good CD uniformity to be produced.SOLUTION: There are provided: a salt comprising a cation having an ethylenically polymerizable group and an anion having an ethylenically polymerizable group which are represented by specific formulae; an acid generator; a resin; and a resist composition.SELECTED DRAWING: None
Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2022185598A
Publication Date:
June 06, 2023
Filing Date:
November 21, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C309/12; C07C309/17; C07D333/76; C08F12/04; C08F20/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP