Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020015713
Kind Code:
A
Abstract:
To provide a salt from which a resist pattern having good CD uniformity (CDU) can be produced.SOLUTION: The salt is a specific sulfonium compound represented by, for example, formula (1-1) below.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
FUJITA SHINGO
ICHIKAWA KOJI
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2019118413A
Publication Date:
January 30, 2020
Filing Date:
June 26, 2019
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C381/12; C07C309/17; C07D307/00; C07D321/06; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2012136511A | 2012-07-19 | |||
| JP2017206681A | 2017-11-24 | |||
| JP2018108959A | 2018-07-12 | |||
| JP2000186071A | 2000-07-04 | |||
| JPH10282669A | 1998-10-23 |
Foreign References:
| WO2005116151A1 | 2005-12-08 | |||
| WO2017135003A1 | 2017-08-10 |
Other References:
ORGANIC LETTERS (2017), vol. 19(4), JPN6022054600, pages 838 - 841, ISSN: 0004953466
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation