Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020200305
Kind Code:
A
Abstract:
To provide a salt that makes it possible to produce a resist pattern with excellent pattern collapse resistance, an acid generator and a resist composition containing the same.SOLUTION: The present invention provides a salt represented by formula (I), an acid generator and a resist composition [where R1a and R2a each denote H or a hydrocarbon group, or R1a and R2a bind to each other and form a ring; R3a denotes H, or R1a, R2a, and R3a bind to each other and form a ring; R4 denotes a halogen atom, a fluorinated alkyl group or the like; R5 denotes a halogen atom, a fluorinated alkyl group or -CO-O-CR1bR2bR3b or the like; R1b and R2b each denote H or a hydrocarbon group, or R1b and R2b bind to each other and form a ring; R3b denotes H, or R1b, R2b and R3b bind to each other and form a ring; m4 denotes an integer of 0-4, m5 denotes an integer of 0-5; Q1 and Q2 each denote a fluorine atom or a perfluoroalkyl group; L1 denotes a saturated hydrocarbon group; Y1 denotes a methyl group or an alicyclic hydrocarbon group].SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2020072477A
Publication Date:
December 17, 2020
Filing Date:
April 14, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/76; C07C309/17; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation