Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023008906
Kind Code:
A
Abstract:
To provide a salt which allows a resist pattern having a good mask error factor (MEF) to be produced, and a resist composition containing the same.SOLUTION: There are provided a salt containing a sulfonium represented by a specific formula, an acid generator, and a resist composition.SELECTED DRAWING: None
Inventors:
KOMURO KATSUHIRO
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
TERAHIGASHI SHOHEI
ICHIKAWA KOJI
Application Number:
JP2022104081A
Publication Date:
January 19, 2023
Filing Date:
June 28, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C309/12; C07D307/00; C07D313/06; C07D321/10; C08F20/18; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation