SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023014044

Kind Code:

A

Abstract:

To provide a salt that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.SOLUTION: The present invention provides a salt represented by a specific structural formula, an acid generator and a resist composition.SELECTED DRAWING: None

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Inventors:

SHIMADA MASAHIKO
ICHIKAWA KOJI

Application Number:

JP2022112558A

Publication Date:

January 26, 2023

Filing Date:

July 13, 2022

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07D305/06; C08F220/28; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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