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Title:
SCANNING ALIGNER, SCANNING EXPOSURE METHOD, METHOD FOR MANUFACTURING DEVICE, AND DEVICE
Document Type and Number:
Japanese Patent JP3652329
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a scanning aligner for easily reproducing a high resolution and a projection image on a large screen for a mask deformed by its own weight in the scanning aligner for projecting mask patterns to a substrate, and to provide a method for manufacturing a device using the aligner.
SOLUTION: The scanning aligner, comprising an arc illumination optical system 7, a projection optical system 4 for projecting a pattern within a mask 1 illuminated by the illumination optical system to the substrate 5, a mask stage 2 for scanning the mask, and a substrate stage 6 for making the substrate scan, scans the mask stage and the substrate stage in synchronizing each other. To position the mask pattern image and the substrate to a predetermined positional relation, the scanning aligner has a mask supporting means for supporting a peripheral part of the mask, and a mask stage inclination means for setting the pattern within the illumination region of the mask deformed by its own weight resulted from the peripheral support within a focal surface of the body surface side of the projection optical system.


Inventors:
Toru Koda
Shinji Tsutsui
Application Number:
JP2002191329A
Publication Date:
May 25, 2005
Filing Date:
June 28, 2002
Export Citation:
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Assignee:
Canon Inc
International Classes:
G02F1/13; G03F1/44; G03F7/20; G03F7/207; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F7/207
Domestic Patent References:
JP2000100709A
JP9283436A
JP2001313241A
JP8306618A
JP4277612A
JP200047390A
JP11195595A
Attorney, Agent or Firm:
Ryosuke Fujimoto