Title:
走査型電子顕微鏡装置
Document Type and Number:
Japanese Patent JP6934980
Kind Code:
B2
Abstract:
A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.
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Inventors:
Massnaghetti Douglas
Toss Gabor
Trise david
Boss lalo hit
Chen Grace H
Kenippelmeier liner
Toss Gabor
Trise david
Boss lalo hit
Chen Grace H
Kenippelmeier liner
Application Number:
JP2020081280A
Publication Date:
September 15, 2021
Filing Date:
May 01, 2020
Export Citation:
Assignee:
KLA Corporation
International Classes:
H01J37/05; H01J37/28; H01J37/20; H01J37/244
Domestic Patent References:
| JP10012684A | ||||
| JP60007049A |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office