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Patent Searching and Data


Title:
SCANNING TYPE ELECTRON MICROSCOPE
Document Type and Number:
Japanese Patent JPH06150868
Kind Code:
A
Abstract:

PURPOSE: To improve observing accuracy of a surface of a sample by arranging an electric field/magnetic field imparting means between an electron optical system and the sample.

CONSTITUTION: An electron beam 11 generated from a beam generating source 10 is radiated to the surface of a sample 17 through an electron optics system 12 containing a leader electrode 13, an accelerating electrode 14, a convergent lens 15, an objective lens 16 and the like. A reflected electron from the surface of the sample 17 is detected by detectors 18, and electric signals from the detectors 18 are sent to a display device 21 through an amplifier 19 and a signal processing circuit 20, and an image is displayed. In order to correct an incident angle of the electron beam 11 radiated to the sample 17, an electric field/magnetic field imparting means 22 to generate an optional size electric field or magnetic field is arranged between the electron optical system 12 and the sample 17.


Inventors:
IWATA FUTOSHI
TANAKA HIROYUKI
Application Number:
JP29303892A
Publication Date:
May 31, 1994
Filing Date:
October 30, 1992
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
H01J37/147; H01J37/28; (IPC1-7): H01J37/28; H01J37/147
Attorney, Agent or Firm:
Teiichi