Title:
微細相分離パターン形成のための自己組織化膜形成組成物
Document Type and Number:
Japanese Patent JP7070434
Kind Code:
B2
Abstract:
A self-assembled film-forming composition for orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer including a block copolymer, in the whole surface of a coating film, even at high heating temperatures at which arrangement failure of the microphase separation of the block copolymer occurs. The self-assembled film-forming composition includes a block copolymer, and at least two solvents having different boiling points as a solvent. The block copolymer is obtained by bonding: a non-silicon-containing polymer having, as a structural unit, styrene, a derivative thereof, or a structure derived from a lactide; and a silicon-containing polymer having, as a structural unit, styrene substituted with silicon-containing groups. The solvent includes: a low boiling point solvent (A) having a boiling point of 160° C. or lower; and a high boiling point solvent (B) having a boiling point of 170° C. or higher.
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Inventors:
Ryuta Mizuochi
Yasunobu Someya
Hiroyuki Wakayama
Rikimaru Sakamoto
Yasunobu Someya
Hiroyuki Wakayama
Rikimaru Sakamoto
Application Number:
JP2018563320A
Publication Date:
May 18, 2022
Filing Date:
January 16, 2018
Export Citation:
Assignee:
Nissan Chemical Co., Ltd.
International Classes:
C09D125/08; B05D7/24; C09D7/20; C09D153/00; C09D167/04
Domestic Patent References:
| JP2015005750A | ||||
| JP2017501267A | ||||
| JP2014186773A |
Foreign References:
| WO2016068261A1 |
Attorney, Agent or Firm:
Patent business corporation Tsukuni