To obtain flexibility in response to the construction of a vibration- resistant equipment for a semiconductor factory, and to constitute the equipment at a low cost.
In the semiconductor factory in which a utility floor 70 is installed at the underfloor section of a clean room 60, the floor 64 of the lower layer floor of the clean room 60 is constituted of the floor 64 having rigidity, the floor 61 of the clean room 60 is manufactured in one-way beam type or a cruciform beam type, the utility floor is formed in structure in which rigidity is increased by adding clustered columns 66, and a section between the floor 74 of the lower layer floor of the clean room 60 and the floor 61 of the clean room 60 is connected by the clustered columnar 66 having rigidity capable of preventing microvibrations.
TANIGUCHI KAZUTO
KANEKO TOYOZO
SHIGA HIROMITSU
NAKAGAWA YOSHIO
ABE TAKAYUKI
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