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Title:
SEMICONDUCTOR LASER, SEMICONDUCTOR WAFER AND THEIR MANUFACTURING METHODS
Document Type and Number:
Japanese Patent JP2002118323
Kind Code:
A
Abstract:

To provide a semiconductor laser used for various types of electronic equipment and a semiconductor wafer of its material and a method for manufacturing the wafer, and to enhance stability of the oscillation wavelength of the laser.

The semiconductor laser comprises an InGaAsP 13 as an active layer interposed between a p-type InP clad layer 12 and an n-type InP clad layer 14. In this case, a piezoelectric material 11 is adhered to the layer 12. With this constitution, a voltage applied between an AuZn 17 electrode and an Au 18 electrode is controlled to distort the material 11 and to apply a stress to the layer 13. The stability of the oscillation wavelength of the laser is enhanced by controlling the voltage applied to the piezoelectric material.


Inventors:
TANAKA HIDEYUKI
Application Number:
JP2000308764A
Publication Date:
April 19, 2002
Filing Date:
October 10, 2000
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
H01S5/0687; H01S5/026; H01S5/18; (IPC1-7): H01S5/0687; H01S5/026; H01S5/18
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)