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Patent Searching and Data


Title:
SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS
Document Type and Number:
Japanese Patent JP2002270667
Kind Code:
A
Abstract:

To simultaneously inspect a semiconductor wafer, while performing a semiconductor manufacturing process with respect to the semiconductor wafer.

A plurality of semiconductor wafer as a unit are installed in a semiconductor manufacturing apparatus 1, each semiconductor wafer being subjected to a semiconductor manufacturing process, and any one of the semiconductor wafers after subjected to the semiconductor manufacturing process is externally extracted from a position 5 different from a position 3 at which the plural wafers were installed in the apparatus 1, and the extracted semiconductor wafer is inspected. When the wafer is decided as being acceptable, the wafer is again returned into the apparatus 1 from the position 5 different from the position 3, and returned wafer is returned to the position 3, together with the other semiconductor wafers by plural number, after completion subjected to the semiconductor manufacturing process.


Inventors:
MAKITA TOSHIYUKI
Application Number:
JP2001069136A
Publication Date:
September 20, 2002
Filing Date:
March 12, 2001
Export Citation:
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Assignee:
SONY CORP
International Classes:
H01L21/66; H01L21/00; H01L21/205; H01L21/677; (IPC1-7): H01L21/68; H01L21/205; H01L21/66
Attorney, Agent or Firm:
Akira Koike (2 outside)