Title:
SHAPE MEASUREMENT METHOD AND SHAPE MEASUREMENT DEVICE
Document Type and Number:
Japanese Patent JP2020041991
Kind Code:
A
Abstract:
To provide a shape measurement method in which the shape of periodically arranged fine patterns can be measured with higher accuracy than before, regardless of orientation.SOLUTION: According to an embodiment, in a shape measuring method, first, a substrate having a pattern is irradiated with electromagnetic waves within a measurement range of a predetermined incident azimuth angle, and the scattering intensity of the electromagnetic waves scattered from the substrate is measured. Next, shape information on a unit structure in the pattern is calculated on the basis of the scattering intensity of the electromagnetic waves. Then, in the measurement of the scattering intensity, the measurement range is divided into a plurality of regions and different measurement conditions are set between regions adjacent to each other.SELECTED DRAWING: Figure 1
Inventors:
HAGIWARA KAZUKI
Application Number:
JP2018171860A
Publication Date:
March 19, 2020
Filing Date:
September 13, 2018
Export Citation:
Assignee:
KIOXIA CORP
International Classes:
G01N23/201; G01B15/00
Attorney, Agent or Firm:
Sakai International Patent Office