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Title:
SHOCK ABSORBING MECHANISM OF ROTATIONAL RETREAT UNIT
Document Type and Number:
Japanese Patent JP2006038199
Kind Code:
A
Abstract:

To provide a shock absorbing mechanism of a rotational retreat unit for securing safety of an operator and the periphery, by moving in an always stable state, regardless of a difference in the operator, in a retreat process and a return process of the rotational retreat unit to a body unit of a device for performing predetermined treatment.

This shock absorbing mechanism of the rotational retreat unit is placed in an upper part of the body unit of the device, and can retreat from the body unit by rotating upward with a connedcting part connected at its one end to the body unit as a fulcrum. The shock absorbing mechanism has a retreat torque reducing device for reducing retreat torque by energizing the retreat unit by generating torque corresponding to the retreat torque required for a rotational retreat of the retreat unit, a retreat time shock absorber for controlling a rotational retreat speed of the retreat unit in the retreat process of the retreat unit, and a return time shock absorber for controlling a rotational return speed of the retreat unit in the return process of the retreated retreat unit.


Inventors:
ISHIZUKA TETSUYA
Application Number:
JP2004223382A
Publication Date:
February 09, 2006
Filing Date:
July 30, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
F16F15/02; F16F15/023; F16F15/04; G03D15/02
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hiroshi Fukushima