Title:
SILICA GLASS MEMBER AND MANUFACTURING METHOD OF SILICA GLASS MEMBER
Document Type and Number:
Japanese Patent JP2019099414
Kind Code:
A
Abstract:
To provide a silica glass member achieving low thermal expansion required when miniaturization of a device is conducted using a multi patterning by setting fluorine concentration at a prescribed concentration range in a zone from a surface to a prescribed depth, and a manufacturing method of the silica glass member.SOLUTION: The silica glass member is a silica glass used in an optical lithography process with a vacuum ultraviolet light as a light source. Content of fluorine is 1.0 wt.% to 5.0 wt.% in a zone from a surface of a silica glass surface vertical to a transmission direction of a lithography light to 50 μm.SELECTED DRAWING: None
More Like This:
Inventors:
FUKAZAWA YUJI
Application Number:
JP2017231528A
Publication Date:
June 24, 2019
Filing Date:
December 01, 2017
Export Citation:
Assignee:
COORSTEK KK
International Classes:
C03C3/06; C03B20/00; G03F7/20
Attorney, Agent or Firm:
Kinoshita Shigeru
Yuko Sawada
Yuko Sawada