SILSESQUIOXANE WITH CAGE STRUCTURE AND RESIST COMPOSITION

Title:

SILSESQUIOXANE WITH CAGE STRUCTURE AND RESIST COMPOSITION

Document Type and Number:

Japanese Patent JP2023166174

Kind Code:

A

Abstract:

To provide a resist composition including a silsesquioxane with a cage structure, which exhibits superior dry etching resistance and can form a fine pattern when short-wavelength light sources, such as electron beams and extreme ultraviolet light (EUV), are used.SOLUTION: The present invention provides a silsesquioxane with a cage structure represented by the following formula 1: (RmSiO1.5)m. In the formula, Rm represents a hydrocarbon group and m is an integer of 3-30. Rm includes Ra or different structures of Ra and Rb, where Ra has an acid-dissociable group, and Rb has a group that absorbs at least one of extreme ultraviolet rays and electron beams to produce secondary electrons.SELECTED DRAWING: None

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Inventors:

ONO FUMI
MURATA TAKAO
MORI HIDEHARU
MURATA SHOTA

Application Number:

JP2022077037A

Publication Date:

November 21, 2023

Filing Date:

May 09, 2022

Export Citation:

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Assignee:

MITSUBISHI CHEM CORP

International Classes:

G03F7/039; G03F7/075

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