Title:
SKIN LOTION
Document Type and Number:
Japanese Patent JP2007084446
Kind Code:
A
Abstract:
To provide a means for inhibiting the activity of a TGF-βII type receptor, and treating keloid, hypertrophic scar and scar.
This skin lotion is obtained by incorporating a compound expressed by general formula (1) [wherein, R1 to R10 are each independently H, a 1-4C alkyloxy or hydroxy] or its salt in skin lotion. As the compound expressed by the general formula (1), morin is preferable. The content of the compound expressed by the general formula (1) and/or its salt is preferably 0.1-10 mass%, the skin lotion is preferably used for a treatment of the keloid, hypertrophic scar or scar, and the subjects of treatment are preferably the keloid, hypertrophic scar and scar caused by the TGF-β.
Inventors:
FURUYA TOSHIO
YOKOTAGAWA TAKAMINE
NISHIMORI YASUTOMO
KIMURA MAKOTO
YUASA MASAYUKI
SHIMANUKI TOMOMASA
YOKOTAGAWA TAKAMINE
NISHIMORI YASUTOMO
KIMURA MAKOTO
YUASA MASAYUKI
SHIMANUKI TOMOMASA
Application Number:
JP2005271832A
Publication Date:
April 05, 2007
Filing Date:
September 20, 2005
Export Citation:
Assignee:
POLA CHEM IND INC
International Classes:
A61K31/352; A61K8/00; A61K8/49; A61P17/00; A61P17/02; A61P43/00; A61Q19/00; C07D311/30
Domestic Patent References:
| JP2001055330A | 2001-02-27 | |||
| JPS63179824A | 1988-07-23 | |||
| JP2003171274A | 2003-06-17 | |||
| JP2000319154A | 2000-11-21 | |||
| JPH08301757A | 1996-11-19 |