Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SOLVENT COMPOSITION FOR CLEANING
Document Type and Number:
Japanese Patent JP3209450
Kind Code:
B2
Abstract:

PURPOSE: To provide a solvent composition for cleaning containing a cyclic hydrofluorocarbon having a specific carbon number and a cyclic structure and containing hydrogen atom, capable of effectively removing the flux, oil and dust on an electronic part, etc., and usable as a detergent, etc., free from the problem of ozonosphere destruction.
CONSTITUTION: The solvent composition for cleaning, having excellent cleaning power, high decomposition speed in atmosphere and short life and, accordingly, absolutely free from influence on ozonosphere is produced by compounding (A) a ≥6C cyclic hydrofluorocarbon having 5 to 8-membered ring and containing at least one hydrogen atom (e.g. 1,1,2,2,3,3,4,4,5,6-decafluorocyclohexane), (B) one or more kinds of solvents soluble in the component A and selected from ≥5C alkanes, ≥5C cycloalkanes, alcohols, ketones, ethers, esters, hydrohalocarbons, hydrochlorofluorocarbons, etc., and (C) a nonionic surfactant (e.g. alkylpolyoxyethylene ether).


Inventors:
Takeo Kitamura
Michino Ikehata
Yukio Otoshi
Keiichi Ohnishi
Yoko Usami
Application Number:
JP16398992A
Publication Date:
September 17, 2001
Filing Date:
May 29, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Asahi Glass Co., Ltd.
International Classes:
C08J7/00; C09D9/00; C11D7/50; C11D7/60; C11D10/02; C23G5/028; (IPC1-7): C11D7/50; C08J7/00; C09D9/00; C11D7/60; C11D10/02; C23G5/028
Domestic Patent References:
JP2191581A
JP331400A
JP6510297A
Other References:
【文献】欧州特許出願公開465037(EP,A1)